Hong Jin Fan

Dr. Hong Jin Fan is now an associate professor in Nanyang Technological University since 2014. He received his PhD from National University of Singapore in 2003. After that he was a postdoc at Max-Planck-Institute of Microstructure Physics, Germany and University of Cambridge. Dr. Fan is working on metal-oxide nanostructures and their energy conversion and storage applications. He is also interested in atomic layer deposition and SERS (surface enhanced Raman scattering). Dr. Fan has published 120+ journal articles, including 5 invited Review papers. His work has been cited >5000 times with an H-index of 38. Their work was selected 10 times for highlighting as covers of high-profile journals, such as Advanced Materials, Advanced Functional Materials, ACS Nano. He has organized co-organized symposia in international conferences including 2008 and 2010 MRS Spring, 2011 MRS Fall, ICMAT 2011 and 2013. Currently he is a Editorial Board Member of the jouranal Nanotechnology, and editor of Materials Research Bulletin. Specialties: Semiconductor nanowires, Atomic layer deposition for nanofabrication and surface engineering, Materials in Energy storage and generation (supercapacitors and photoelectrochemical cells)